INSP - UPMC - 4 place Jussieu - 75005 Paris - Barre 22-23, 4e étage, salle 317
Tianhong Cui - University of Minnesota
Polymer shrinkage becomes a new approach to do lithography and generate smaller structures by reforming larger pre-patterned structures. The facile polymer fabrication approach by embossing and thermoplastic shrinkage aims to do lithography in a nanoscale or reduce the feature size and dramatically increase the aspect ratioof imprinted microstructures. The shrinkage capability of embossed microstructures is reserved by molding at low temperatures for less cycle time. Embossed patterns are activated for shrinkage by removing projected structures and heating at higher temperatures. The final structures aredefined withthe shapeof removed materials before shrinking polymer materials. Bothtwo-and three-dimensional embossed structures were successfullyshrunk into much smaller scale. This polymer-shrinking process brings a new way to extend the fabrication capability of polymer embossing process.This talk will present shrink polymer for nanolithography, high-aspect-ratio microstructures, and biosensors for medical applications.